外延基硅锗异质结双极晶体管的静电放电特性

S. Voldman, P. Juliano, J. Schmidt, R. Johnson, L. Lanzerotti, Alvin J. Joseph, C. Brennan, James S. Dunn, D. Harame, Elyse Rosenbaum, B. Meyerson
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引用次数: 33

摘要

本文研究了基-集电极、基-发射极、集电极-发射极和集电极-衬底结构的假晶外延基硅锗异质结双极晶体管(HBTs)中的大电流和静电放电(ESD)现象。完成了SiGe hts的传输线脉冲(TLP)和ESD人体模型(HBM)晶圆级可靠性测试,用于BiCMOS SiGe技术的大电流表征和ESD稳健性评估。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electrostatic discharge characterization of epitaxial-base silicon-germanium heterojunction bipolar transistors
This paper investigates high-current and electrostatic discharge (ESD) phenomena in pseudomorphic epitaxial-base silicon-germanium (SiGe) heterojunction bipolar transistors (HBTs) in base-collector, base-emitter, collector-emitter and collector-to-substrate configurations. Transmission line pulse (TLP) and ESD human body model (HBM) wafer-level reliability testing of SiGe HBTs is completed for high-current characterization and evaluation of the ESD robustness of a BiCMOS SiGe technology.
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