Direct formation of nanostructures by focused electron beam on a surface of thin metallic films

This paper describes a method, which allows obtaining metallic nanostructures (MN) by focused electron beam irradiation in scanning electron microscope (SEM) in one fabrication step and without the use of additional chemicals. MN-nanodots were obtained by 30kV SEM on surfaces of various metallic thin films (Al, Cr, Cu, Mo, Ag). The thin films were prepared by direct current magnetron sputtering on Si substrate with 500 nm thickness. The size and shape of the obtained MN were measured with atomic force microscope. The height of the nanodots was up to 500 nm and their width at half height was in a range from 100 to 500 nm. The size of the obtained MN depends on the parameters of electron beam and properties of the metal. Possible mechanisms of MN forming under the influence of focused electron beam are discussed.