工业设计中开孔缺陷的提取

A. Ladhar, M. Masmoudi
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引用次数: 2

摘要

根据以往的研究,短路和开路应该被认为是CMOS电路失效的主要原因。针对这些缺陷提取的故障模型和工具只关注桥接故障,以便生成测试模式或将此信息用于精确的故障诊断。然而,对于开放缺陷,没有可用的商业工具来执行该缺陷的提取。在本文中,我们提出了一种新的算法来提取由缺陷过孔引起的潜在开放缺陷的位置。此信息用于生成一个子网列表,其中包含每个有缺陷的通道断开的段的名称。在实际工业设计上的实验证明了该算法的有效性。本文提出的方法得到了实现现有商业CAD工具的设计流程的支持。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Extraction of open-via defects from industrial designs
As shown by previous studies, shorts and opens should be considered as the predominant cause of failures in CMOS circuits. Fault models and tools targeting the extraction of these defects focused only on the bridging faults in order to generate test patterns or to use this information for a precise fault diagnosis. However, for open defects there is no available commercial tool that performs the extraction of this defect. In this paper, we present a novel algorithm to extract the location of potential open defects caused by defective vias. This information is used to generate a subnet list containing the name of disconnected segments by each defective via. Experiments on real industrial designs show the algorithm's performance. The method proposed in this paper is supported by a design flow implementing existing commercial CAD tools.
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