电子轰击半导体功率器件的展望

D. J. Bates, R. Knight
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摘要

20年来,电子轰击半导体(EBS)设备在功率放大和功率控制应用方面显示出了前景。直到最近,产品还没有上市;然而,商业上可用的设备现在提供优于竞争半导体和真空管的特性。对于EBS的工作原理,给出了两种设备配置以及目前和预计的性能特征。还包括脉冲和连续波放大器的优点数字,用于将EBS与其他设备进行比较。EBS的生命周期,从它的诞生到它现在的青春期早期,包含了相当多的斗争。两种外国技术的结合产生了现在才证明其早期拥护者支持的后代,因此EBS必须被视为新兴设备。当与射频功率晶体管进行比较时,应该记住这一点,射频功率晶体管是成熟的器件,未来只有很小的性能改进。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A perspective on electron bombarded semiconductor power devices
For 20 years, Electron Bombarded Semiconductor, or EBS, devices have shown promise for power amplification and power control applications. Until recently, products were not available; however, commercially available devices now provide characteristics superior to competing semiconductors and vacuum tubes. For the EBS operating principle, two device configurations and present and projected performance characteristics are given. Also included are figures of merit for pulsed and CW amplifiers for use in comparing the EBS with other devices. The life cycle of the EBS, from its birth through its present early adolescence, has involved Considerable struggle. The marriage of two foreign technologies has resulted in an offspring which only now is justifying the support of its early advocates, thus, the EBS must be considered to be an emerging device. This should be remembered when comparisons are made to RF power transistors, which are mature devices with only small evolutionary performance improvements to be expected in the future.
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