不同氧流量对Ta2O5薄膜折射率和吸收特性的影响

Chenghui Jiang, Lishuan Wang, Shida Li, Hua-song Liu, Yugang Jiang, Meiping Zhu, Yi-qin Ji
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引用次数: 1

摘要

Ta2O5薄膜在可见光范围内具有较低的吸收,具有较高的折射率和热稳定性。因此被广泛用于制备低损耗薄膜。采用离子束溅射技术制备了不同氧流速的Ta2O5单层膜。比较了不同氧流量下金属氧化物薄膜的折射率和吸收特性。利用椭偏技术和表面热透镜技术研究了薄膜材料的折射率和吸收率。结果表明:随着氧流量的增加,Ta2O5膜的吸收率先降低后增加;当氧气流量为40 sccm时,吸收率最小,仅为4.4ppm。折射率随氧气流量的增加而减小,当氧气流量达到40 sccm后,折射率趋于稳定。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effects of different oxygen flow on refractive index and absorption characteristics of Ta2O5 film
Ta2O5 film has low absorption in the range of visible wavelength and it has high refractive index and thermal stability. So it is widely used to prepare low loss films. Ta2O5 single layer with different oxygen flow rates were prepared by ion beam sputtering technique. The refractive index and absorption characteristics of metal oxide films were compared at different oxygen flow rates. The refractive index and absorption of thin film materials were studied by ellipsometry technology and surface thermal lens technology. The results show that: the absorption of Ta2O5 film is decreased first and then increased with the increase of oxygen flow. When oxygen flow is 40 sccm, the absorption is smallest, only 4.4ppm. And the refractive index is decreased with oxygen flow increasing, after oxygen flow reached 40 sccm, the refractive index tend to be stable.
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