M. Lomaev, V. Tarasenko, Alexander V. Diatlov, A. Burachenko
{"title":"高压纳秒放电等离子体在真空和气体二极管中产生电子束的累积效应","authors":"M. Lomaev, V. Tarasenko, Alexander V. Diatlov, A. Burachenko","doi":"10.1117/12.2548440","DOIUrl":null,"url":null,"abstract":"Cumulation effect of a beam of runaway electrons formed in a high-voltage nanosecond discharge in air at pressures of 3-105 Pa and discharge gap length d of 1 - 5 mm was studied. Optimal conditions of the effect in discharge gap with a tubular potential cathode and grounded flat anode was achieved at an air pressure of ~ 5 Pa and d of 2.7 mm. An electron beam current pulse was recorded behind a foil anode with high (up to ~ 80 ps) time resolution. It was found that, due to the cumulation effect, a through hole is formed in an aluminum foil 20 μm thick after 2-3 discharge pulses. The electron beam was found to register around the zone of maximum beam current density as well. As follows","PeriodicalId":205170,"journal":{"name":"Atomic and Molecular Pulsed Lasers","volume":"80 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-12-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Cumulation effect of an electron beam generated in a high-voltage nanosecond discharge plasma in vacuum and gas diodes\",\"authors\":\"M. Lomaev, V. Tarasenko, Alexander V. Diatlov, A. Burachenko\",\"doi\":\"10.1117/12.2548440\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Cumulation effect of a beam of runaway electrons formed in a high-voltage nanosecond discharge in air at pressures of 3-105 Pa and discharge gap length d of 1 - 5 mm was studied. Optimal conditions of the effect in discharge gap with a tubular potential cathode and grounded flat anode was achieved at an air pressure of ~ 5 Pa and d of 2.7 mm. An electron beam current pulse was recorded behind a foil anode with high (up to ~ 80 ps) time resolution. It was found that, due to the cumulation effect, a through hole is formed in an aluminum foil 20 μm thick after 2-3 discharge pulses. The electron beam was found to register around the zone of maximum beam current density as well. As follows\",\"PeriodicalId\":205170,\"journal\":{\"name\":\"Atomic and Molecular Pulsed Lasers\",\"volume\":\"80 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-12-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Atomic and Molecular Pulsed Lasers\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.2548440\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Atomic and Molecular Pulsed Lasers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2548440","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Cumulation effect of an electron beam generated in a high-voltage nanosecond discharge plasma in vacuum and gas diodes
Cumulation effect of a beam of runaway electrons formed in a high-voltage nanosecond discharge in air at pressures of 3-105 Pa and discharge gap length d of 1 - 5 mm was studied. Optimal conditions of the effect in discharge gap with a tubular potential cathode and grounded flat anode was achieved at an air pressure of ~ 5 Pa and d of 2.7 mm. An electron beam current pulse was recorded behind a foil anode with high (up to ~ 80 ps) time resolution. It was found that, due to the cumulation effect, a through hole is formed in an aluminum foil 20 μm thick after 2-3 discharge pulses. The electron beam was found to register around the zone of maximum beam current density as well. As follows
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