定制Ge-Sb-O合金中的氧浓度,以实现飞焦耳级相变存储器操作

Jiangjing Wang, Xiaozhe Wang, Yudong Cheng, Jie Tan, C. Nie, Zhe Yang, Ming Xu, Xiangshui Miao, Wei Zhang, En Ma
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引用次数: 6

摘要

硫系相变材料(PCMs),特别是旗舰产品Ge2Sb2Te5 (GST),是高级存储器应用的主要候选者。然而,传统器件中的GST存在高功耗问题,因为RESET操作需要熔化结晶GST相。最近,我们利用自分解的Ge-Sb-O (GSO)合金开发了一种用于低功率相变应用的导电桥方案。在这项工作中,我们通过调整相分离GSO系统中氧的浓度,对GSO薄膜进行了全面的结构和电学表征。我们阐明了在引入氧后沉积非晶膜的两步过程:随着氧掺杂水平的增加,首先形成氧化锗,其次是氧化锑。为了实现飞焦耳级RESET能量的电桥开关模式,氧含量必须足够低,以保持富锑畴在外部电刺激下容易结晶。我们的工作可以作为一个有用的例子,利用合金分解开发异质pcm,最大限度地减少低功耗电子器件的有源开关体积。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Tailoring the oxygen concentration in Ge-Sb-O alloys to enable femtojoule-level phase-change memory operations
Chalcogenide phase-change materials (PCMs), in particular, the flagship Ge2Sb2Te5 (GST), are leading candidates for advanced memory applications. Yet, GST in conventional devices suffer from high power consumption, because the RESET operation requires melting of the crystalline GST phase. Recently, we have developed a conductive-bridge scheme for low-power phase-change application utilizing a self-decomposed Ge-Sb-O (GSO) alloy. In this work, we present thorough structural and electrical characterizations of GSO thin films by tailoring the concentration of oxygen in the phase-separating GSO system. We elucidate a two-step process in the as-deposited amorphous film upon the introduction of oxygen: with increasing oxygen doping level, germanium oxides form first, followed by antimony oxides. To enable the conductive-bridge switching mode for femtojoule-level RESET energy, the oxygen content should be sufficiently low to keep the antimony-rich domains easily crystallized under external electrical stimulus. Our work serves as a useful example to exploit alloy decomposition that develops heterogeneous PCMs, minimizing the active switching volume for low-power electronics.
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CiteScore
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