基于三维集成电路的TSV老化和TSV软误差热机械应力分析框架

R. P. Reddy, A. Acharyya, S. Khursheed
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引用次数: 2

摘要

CMOS老化、瞬态效应和TSV热机械应力降低了3d - ic的回弹性。瞬态效应导致软误差,并随着CMOS偏置温度不稳定性(BTI)的增大而加剧。本文分析了三维集成电路中有害瞬态和BTI对软误码率的影响。然而,TSV热机械应力表现出相当大的好处,通过提高临界电荷(Qc)和降低SER,由于阈值电压的降低和晶体管中载流子的迁移率的增加,存在于禁止区和有用范围之外。因此,我们提出了一个框架来评估瞬态、BTI和TSV热机械应力对3d - ic中临界电荷和SER的影响。随后,通过HSPICE模拟我们发现,在10年的寿命内,在堆叠3D-IC的最上层,NAND门的SER降低了5.12% - 9.05%,在6T SRAM中,存储0和1分别降低了2.51% - 4.76%和3.77% - 5.64%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Framework for TSV Based 3D-IC to Analyze Aging and TSV Thermo-Mechanical Stress on Soft Errors
The CMOS aging, transient effects, and TSV thermomechanical stress degrade the resilience of 3D-ICs. The transients effects lead to soft errors and aggravated with the CMOS Bias temperature instability (BTI). In this paper, we analyze detrimental transient and BTI effect on soft error rate (SER) in 3D-ICs. However, TSV thermomechanical stress presents a considerable benefit by enhancing the critical charge (Qc) and reduce the SER due to decrease in the threshold voltage and increase in mobility of carriers in transistor present out of keep-out-zone and useful range. Therefore we propose a framework to evaluate the effect of transient, BTI, and TSV thermomechanical stress on critical charge and SER in 3D-ICs. Subsequently, through HSPICE simulation we show that for a lifetime of ten years and on the topmost layer of stacked 3D-IC, the reduction in SER of NAND gate by 5.12% – 9.05% and in 6T SRAM 2.51% – 4.76% and 3.77% – 5.64% decrease for storing 0 and 1 respectively.
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