CMOS兼容NVM的独特挑战和解决方案

J. Bu, W. Belcher, C. Parker, H. Prosack
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引用次数: 2

摘要

CMOS兼容的NVM正在发现越来越多的应用,从模拟修剪应用中的几位到数据或代码的千比特。CMOS兼容性带来了独特的保留和耐用性挑战。浮栅与后端电介质直接接触,降低了高温数据保持性能。漏极和井掺杂剖面没有优化到有利于热载流子的产生和注入。由于严重的氧化损伤,耐久性很差。描述了机制和首选解决方案。实验结果与理论分析相吻合。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Unique Challenges and Solutions in CMOS Compatible NVM
CMOS compatible NVM is finding increasing applications that range from a few bits in analog trim applications to kilobits for data or code. CMOS compatibility comes with unique retention and endurance challenges. The floating gate is in direct contact with backend dielectric, which degrades high temperature data retention performance. Drain and well doping profile are not optimized to favor hot carrier generation and injection. Endurance is poor due to serious oxide damage. Mechanisms and preferred solutions are described. Experiment results match theoretical analysis.
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