{"title":"CMOS兼容NVM的独特挑战和解决方案","authors":"J. Bu, W. Belcher, C. Parker, H. Prosack","doi":"10.1109/NVMT.2006.378876","DOIUrl":null,"url":null,"abstract":"CMOS compatible NVM is finding increasing applications that range from a few bits in analog trim applications to kilobits for data or code. CMOS compatibility comes with unique retention and endurance challenges. The floating gate is in direct contact with backend dielectric, which degrades high temperature data retention performance. Drain and well doping profile are not optimized to favor hot carrier generation and injection. Endurance is poor due to serious oxide damage. Mechanisms and preferred solutions are described. Experiment results match theoretical analysis.","PeriodicalId":263387,"journal":{"name":"2006 7th Annual Non-Volatile Memory Technology Symposium","volume":"48 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Unique Challenges and Solutions in CMOS Compatible NVM\",\"authors\":\"J. Bu, W. Belcher, C. Parker, H. Prosack\",\"doi\":\"10.1109/NVMT.2006.378876\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"CMOS compatible NVM is finding increasing applications that range from a few bits in analog trim applications to kilobits for data or code. CMOS compatibility comes with unique retention and endurance challenges. The floating gate is in direct contact with backend dielectric, which degrades high temperature data retention performance. Drain and well doping profile are not optimized to favor hot carrier generation and injection. Endurance is poor due to serious oxide damage. Mechanisms and preferred solutions are described. Experiment results match theoretical analysis.\",\"PeriodicalId\":263387,\"journal\":{\"name\":\"2006 7th Annual Non-Volatile Memory Technology Symposium\",\"volume\":\"48 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2006 7th Annual Non-Volatile Memory Technology Symposium\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/NVMT.2006.378876\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 7th Annual Non-Volatile Memory Technology Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NVMT.2006.378876","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Unique Challenges and Solutions in CMOS Compatible NVM
CMOS compatible NVM is finding increasing applications that range from a few bits in analog trim applications to kilobits for data or code. CMOS compatibility comes with unique retention and endurance challenges. The floating gate is in direct contact with backend dielectric, which degrades high temperature data retention performance. Drain and well doping profile are not optimized to favor hot carrier generation and injection. Endurance is poor due to serious oxide damage. Mechanisms and preferred solutions are described. Experiment results match theoretical analysis.