表面光电压法监测砷注入SIMOX中重金属含量

L. Jastrzebski, R. Soydan
{"title":"表面光电压法监测砷注入SIMOX中重金属含量","authors":"L. Jastrzebski, R. Soydan","doi":"10.1109/SOI.1988.95402","DOIUrl":null,"url":null,"abstract":"Summary form only given. Surface photovoltage (SPV) was used successfully to measure the iron concentration in as-implanted SIMOX (separation by implanted oxygen) materials. An initial correlation has been established between diffusion lengths measured on the back of SIMOX wafers and Fe concentration measured by SIMS (secondary ion mass spectrometry) and spark source in as-implanted SIMOX films. The SPV measurements are quick, nondestructive, and do not require any additional sample preparation. Therefore, they could be used easily as a quality control method to monitor heavy metals in as-implanted SIMOX layers.<<ETX>>","PeriodicalId":391934,"journal":{"name":"Proceedings. SOS/SOI Technology Workshop","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1988-10-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"Monitoring of heavy metals in as-implanted SIMOX with surface photovoltage\",\"authors\":\"L. Jastrzebski, R. Soydan\",\"doi\":\"10.1109/SOI.1988.95402\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Summary form only given. Surface photovoltage (SPV) was used successfully to measure the iron concentration in as-implanted SIMOX (separation by implanted oxygen) materials. An initial correlation has been established between diffusion lengths measured on the back of SIMOX wafers and Fe concentration measured by SIMS (secondary ion mass spectrometry) and spark source in as-implanted SIMOX films. The SPV measurements are quick, nondestructive, and do not require any additional sample preparation. Therefore, they could be used easily as a quality control method to monitor heavy metals in as-implanted SIMOX layers.<<ETX>>\",\"PeriodicalId\":391934,\"journal\":{\"name\":\"Proceedings. SOS/SOI Technology Workshop\",\"volume\":\"23 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1988-10-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings. SOS/SOI Technology Workshop\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SOI.1988.95402\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings. SOS/SOI Technology Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOI.1988.95402","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7

摘要

只提供摘要形式。成功地利用表面光电压(SPV)测量了注入氧分离(SIMOX)材料中的铁浓度。在SIMOX晶圆背面测量的扩散长度与SIMS(二次离子质谱法)测量的Fe浓度和注入SIMOX薄膜中的火花源之间建立了初步的相关性。SPV测量是快速的,非破坏性的,不需要任何额外的样品制备。因此,它们可以很容易地作为一种质量控制方法来监测植入SIMOX层中的重金属。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Monitoring of heavy metals in as-implanted SIMOX with surface photovoltage
Summary form only given. Surface photovoltage (SPV) was used successfully to measure the iron concentration in as-implanted SIMOX (separation by implanted oxygen) materials. An initial correlation has been established between diffusion lengths measured on the back of SIMOX wafers and Fe concentration measured by SIMS (secondary ion mass spectrometry) and spark source in as-implanted SIMOX films. The SPV measurements are quick, nondestructive, and do not require any additional sample preparation. Therefore, they could be used easily as a quality control method to monitor heavy metals in as-implanted SIMOX layers.<>
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