基于MoS2/GaN结的平面二维/三维半导体异质结构建模

O. Botsula, K. Prykhodko, V. Zozulia
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引用次数: 0

摘要

给出了基于GaN/MoS2结的平面二维/三维半导体异质结构的建模结果。异质结构为一个长度为$1\ \mu\mathrm{m}$的iii -氮化物基平面二极管,二极管底部有一个GaN n型沟道和MoS2层,并与阳极触点相连。通道内掺杂浓度为$(1-6)\cdot 10^{22}\mathrm{m}^{-3}$。提出了二极管二维区域和三维区域之间的电子交换模型。认为二极管二维和三维区域之间的电子跃迁是由于极光学声子散射引起的。对器件中的电子输运进行了蒙特卡罗模拟。得到了电流密度与外加电压的关系。讨论了二硫化钼层参数对二极管电流电压特性的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Modeling of Planar 2D/3D Semiconductor Heterostructures Based on MoS2/GaN Junction
Modeling results of planar 2D/3D semiconductor heterostructure based on GaN/MoS2 junction are presented. The heterostructure represents a III-nitride based planar diode with length of $1\ \mu\mathrm{m}$, The diode has a GaN n-type channel and MoS2 layer placed at the bottom and connected to anode contact. Doping concentration in the channel is $(1-6)\cdot 10^{22}\mathrm{m}^{-3}$. Model of electron exchange between 2D and 3D regions of the diode is proposed. Electron transition between 2D and 3D region of diode is suggested to occur due to polar optical phonon scattering. Monte Carlo simulation of electron transport in device is carried out. Dependences of current density on applied voltage are obtained. Impact of parameters of MoS2 layers on current – voltage characteristic of diodes is discussed.
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