硅微带探测器中辐射诱发的表面泄漏电流

A. Foland, J. Alexander
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引用次数: 9

摘要

在x射线和紫外光照射下,我们观察到了CLEO III型硅微带探测器的感应漏电流。紫外测量表明,损伤仅限于Si-SiO/sub - 2/界面区域。损坏仅表现为泄漏电流,没有额外的1/f噪声或检测器参数的显着变化。在20 keV的x射线中,测量到的比例损伤率为5/spl plusmn/1 nA/cm/sup 2//kRad。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Radiation-induced surface leakage currents in silicon microstrip detectors
After exposure to X-rays and UV light, we have observed induced leakage currents in silicon microstrip detectors designed for CLEO III. UV measurements have shown that the damage is confined to the Si-SiO/sub 2/ interfacial area. The damage is manifested only as a leakage current without additional 1/f noise or significant changes to detector parameters. The scaled damage rate is measured to be 5/spl plusmn/1 nA/cm/sup 2//kRad for 20 keV X-rays.
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