s波段应用中基于GaN HEMT的MMIC高增益低噪声放大器

M. Tasci, O. Sen, Ulas Ozipek, E. Ozbay
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引用次数: 2

摘要

本文介绍了氮化镓、氮化镓、高电子迁移率晶体管、HEMT、单片微波集成电路、MMIC、低噪声放大器、LNAs的设计、制造和测量。电感源反馈(ISF)拓扑结构用于获得更好的输入回波损耗和噪声系数(NF)。三种设计的增益均高于21 dB,输入回波损耗均优于10 dB, s波段的NF值分别为1.7 dB、1.3 dB和0.9 dB。LNA-1为3毫米,LNA-2为2毫米,尺寸比第一个版本缩小了% 46。LNA-3采用高阻栅极偏置来增加输入功率处理。由于在GaN技术的过程中缺乏对SiN层厚度的精确控制,该制造步骤受到影响电容器值的变化的影响。LNA-2和LNA-3设计的匹配电路和整体特性不受电容值变化的太大影响。目标带宽为2.7 ~ 3.5 GHz,实现频率范围为1.5 GHz (2.5 GHz ~ 4ghz)。三种LNA设计分别具有28.1 dBm、33.4 dBm和35.8 dBm输出三阶截距点OIP3;在1 db压缩点P1dB的输出功率分别为18.2 dBm、23.3 dBm和25.9 dBm。对于所有三种LNA设计,群延迟τ$g$都小于0.3纳秒。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
GaN HEMT Based MMIC High Gain Low-Noise Amplifiers for S-Band Applications
In this paper design, fabrication and measurement of three Gallium Nitride, GaN, High Electron Mobility Transistor, HEMT, based Monolithic Microwave Integrated Circuit, MMIC, Low-Noise Amplifiers, LNAs, are presented. Inductive Source Feedback, ISF, topology is used to obtain both better input return loss and noise figure, NF. All three designs achieve higher than 21 dB gain, better than 10 dB input return loss and their NF values are 1.7 dB, 1.3 dB and 0.9 dB in S-band. LNA-1 is 3 ⨯ 5 mm and LNA-2 is 2 ⨯ 3.5 mm, with a % 46 size reduction upon the first version. High resistive gate biasing is utilized in LNA-3 to increase input power handling. Due to the lack of precise control over SiN layer thickness in process in GaN technology, this fabrication step is subject to variations which affects capacitor values. LNA-2 and LNA-3 designs' matching circuitries and overall characteristics are not influenced too much by a change of capacitor values. Targeted bandwidth is 2.7-3.5 GHz, achieved frequency range is 1.5 GHz (from 2.5 GHz to 4 GHz). The three LNA designs have 28.1 dBm, 33.4 dBm, and 35.8 dBm output third-order intercept point, OIP3; and output powers at 1-dB compression points, P1dB, are 18.2 dBm, 23.3 dBm and 25.9 dBm respectively. For all three LNA designs, group delay, τ$g$, is less than 0.3 nanoseconds.
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