SiC(0001)衬底上AlN、GaN和Al/sub x/Ga/sub 1-x/N的体晶、薄膜和图图化结构的生长和表征以及器件相关研究

R. F. Davis, C. Balkas, M. Bremser, O. Nam, W. G. Perry, I. Shmagin, Z. Sitar, B. L. Ward, T. Zheleva, R. Kolbas, R. Nemanich
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引用次数: 0

摘要

只提供摘要形式。在10/spl次/10 mm/sup 2/ 6H-SiC衬底上,在1950-2250/spl度/C的温度下,通过升华-再冷凝生长出厚度为1 mm的AlN单晶。大多数晶体是0.3 mm-1 mm厚的透明层,完全覆盖在衬底上。将介绍拉曼、光学和透射电镜的结果。在NH/sub / 3条件下,将该材料的粉末升华成氮化镓单晶。拉曼和光致发光结果将显示。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Growth and characterization of bulk crystals, thin films and patterned structures of AlN, GaN and Al/sub x/Ga/sub 1-x/N on SiC(0001) substrates and device-related research
Summary form only given. Single crystals of AlN to 1 mm thickness were grown at 1950-2250/spl deg/C on 10/spl times/10 mm/sup 2/ 6H-SiC substrates via sublimation-re-condensation. Most crystals were 0.3 mm-1 mm thick transparent layers completely covering the substrates. Raman, optical and TEM results will be presented. Single crystals of GaN were grown by subliming powders of this material under NH/sub 3/. Raman and photoluminescence results will be shown.
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