玻璃硅阳极直接键合参数的研究

Jia Li, Guo Hao, G. Zhiping, Miao Shujing
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引用次数: 0

摘要

通过MEMS封装测试平台对键合过程中的键合温度和键合时间进行了研究,并对测试硅片的规格进行了实验研究。首先根据阳极键合原理,确定影响键合质量的主要因素。其次,改变键合温度、键合时间以及测试晶圆尺寸等参数,对玻璃硅进行键合对比测试。最后,通过对比试验对每组粘结物的孔隙率进行计算和分析,总结出影响粘结质量的因素,并在粘结条件下取得最佳粘结效果。实验结果表明,当键合电压为1200V,键合温度为445 ~ 455c,键合时间为60s时,孔隙率小于5%。玻璃与硅片的键合质量可以达到最佳。实验结果为提高玻璃硅键合质量提供了依据。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Research on the Glass Silicon Anodic Direct Bonding Parameters
By MEMS packaging test platform for bonding process of bonding temperature and bonding time,and test silicon specifications experimental study.Firstly,according to the anodic bonding principle,the main factors to detemine the effect of bonding quality.Secodly,change the bonding temperature,bonding time,and test wafer size and other parameters,glass silicon bonding contrast test.Finally,the calculation and analysis of comparative test of each group is bonded porosity,summanrized the factors that affect the quality of the bonding and bonding to achieve the best results in the bonding conditions.Experimental results indicate that when the bonding voltage of 1200V,bonding temperature of 445-455c,bonding time is 60s,the void fractin is less than 5%.Glass and Silicon wafer bonding quality can achieve the best. The experimental results in order to improve the glass silicon bonding quaity provides the basis.
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