{"title":"具有0.4 nm信道间隔的高性能DWDM多路复用器和解路复用器","authors":"J.J. Pan, Y. Shi","doi":"10.1109/CLEOE.1998.719490","DOIUrl":null,"url":null,"abstract":"With an ever increasing demand for bandwidths in lightwave communication networks. DWDM with a channel spacing of ≤0.8 nm plays an important role. This requires DWDM devices with a flat-top transmission spectrum, a high channel isolation and low insertion loss for the EDFA flat gain wavelength range [1]. In this paper, DWDM devices with a 0.4 nm channel spacing using apodized FBGs and bandpass WDM filters (BWDM) in cost-effective structures are demonstrated.","PeriodicalId":404067,"journal":{"name":"CLEO/Europe Conference on Lasers and Electro-Optics","volume":"74 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-09-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"High Performance DWDM Multiplexer and Demultiplexer with a 0.4 nm Channel Spacing\",\"authors\":\"J.J. Pan, Y. Shi\",\"doi\":\"10.1109/CLEOE.1998.719490\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"With an ever increasing demand for bandwidths in lightwave communication networks. DWDM with a channel spacing of ≤0.8 nm plays an important role. This requires DWDM devices with a flat-top transmission spectrum, a high channel isolation and low insertion loss for the EDFA flat gain wavelength range [1]. In this paper, DWDM devices with a 0.4 nm channel spacing using apodized FBGs and bandpass WDM filters (BWDM) in cost-effective structures are demonstrated.\",\"PeriodicalId\":404067,\"journal\":{\"name\":\"CLEO/Europe Conference on Lasers and Electro-Optics\",\"volume\":\"74 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1998-09-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"CLEO/Europe Conference on Lasers and Electro-Optics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CLEOE.1998.719490\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"CLEO/Europe Conference on Lasers and Electro-Optics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CLEOE.1998.719490","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
High Performance DWDM Multiplexer and Demultiplexer with a 0.4 nm Channel Spacing
With an ever increasing demand for bandwidths in lightwave communication networks. DWDM with a channel spacing of ≤0.8 nm plays an important role. This requires DWDM devices with a flat-top transmission spectrum, a high channel isolation and low insertion loss for the EDFA flat gain wavelength range [1]. In this paper, DWDM devices with a 0.4 nm channel spacing using apodized FBGs and bandpass WDM filters (BWDM) in cost-effective structures are demonstrated.