室温射频磁控溅射法制备硅衬底纳米棒氧化锌薄膜的结构特性

2013 IEEE International Conference on Smart Instrumentation, Measurement and Applications (ICSIMA) Pub Date : 2013-11-01 DOI:10.1109/ICSIMA.2013.6717947

A. Shafura, N. Sin, M. H. Mamat, M. Uzer, A. Mohamad, M. Rusop

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引用次数: 0

摘要

利用射频磁控溅射技术在室温下成功制备了纳米氧化锌薄膜。研究了射频功率的变化对ZnO薄膜表面特性的影响。利用x射线衍射仪(XRD)、原子力显微镜(AFM)和场发射扫描电镜(FESEM)对薄膜的表面形貌和形貌进行了表征。研究了射频功率对ZnO薄膜表面特性的影响。在250 W的射频功率下沉积的薄膜具有良好的表面形貌和结构性能。

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Structural properties of nanorod zinc oxide thin films on Si substrate deposited by RF magnetron sputtering at room temperature

Nanorod zinc oxide (ZnO) thin films have been successfully deposited using RF magnetron sputtering at room temperature. The RF power was varied and the effect on the surface characteristic of ZnO thin film was studied. The surface topography and morphology of the thin films were characterised using X-ray Diffractometer (XRD), Atomic Force Microscopy (AFM) and Field Emission Scanning Electron Microscopy (FESEM). The paper reveals the effect of RF power on the surface characteristic of ZnO thin film. The films deposited at a RF power of 250 W exhibited the best structural properties with good surface morphology.

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2013 IEEE International Conference on Smart Instrumentation, Measurement and Applications (ICSIMA)

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