{"title":"紫外准分子激光束均匀化在微加工中的应用","authors":"A. F. Zhou","doi":"10.1142/S1793528811000226","DOIUrl":null,"url":null,"abstract":"A UV excimer laser beam delivery system is designed with conventional microlens arrays and diffractive diffuse. Ultraflat and ultrasmooth ablated surfaces with sharp edges are obtained on fused silica. Ablated surfaces of a depth of 5.9 μm with less than 10 nm surface roughness are obtained on fused silica, as measured by an atomic force microscope.","PeriodicalId":106270,"journal":{"name":"Optics and Photonics Letters","volume":"36 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"UV EXCIMER LASER BEAM HOMOGENIZATION FOR MICROMACHINING APPLICATIONS\",\"authors\":\"A. F. Zhou\",\"doi\":\"10.1142/S1793528811000226\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A UV excimer laser beam delivery system is designed with conventional microlens arrays and diffractive diffuse. Ultraflat and ultrasmooth ablated surfaces with sharp edges are obtained on fused silica. Ablated surfaces of a depth of 5.9 μm with less than 10 nm surface roughness are obtained on fused silica, as measured by an atomic force microscope.\",\"PeriodicalId\":106270,\"journal\":{\"name\":\"Optics and Photonics Letters\",\"volume\":\"36 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2011-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optics and Photonics Letters\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1142/S1793528811000226\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optics and Photonics Letters","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1142/S1793528811000226","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
UV EXCIMER LASER BEAM HOMOGENIZATION FOR MICROMACHINING APPLICATIONS
A UV excimer laser beam delivery system is designed with conventional microlens arrays and diffractive diffuse. Ultraflat and ultrasmooth ablated surfaces with sharp edges are obtained on fused silica. Ablated surfaces of a depth of 5.9 μm with less than 10 nm surface roughness are obtained on fused silica, as measured by an atomic force microscope.