绝缘体上的谜和键硅(RABSOI)

R. Spetik, Filip Kudrna, L. Valek
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引用次数: 0

摘要

本文介绍了一种制备部分绝缘体上硅衬底的新方法。此后,PSOI衬底可以用作电源集成技术的起始材料,其中介电隔离器件以及背面电和/或热连接器件都需要在同一芯片上。公开的方法主要依赖于用于常规SOI生产的标准制造工艺步骤,例如晶圆键合,研磨和抛光。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Riddle and Bond Silicon on Insulator (RABSOI)
In this paper, a novel method for creation of Partial Silicon on Insulator (PSOI) substrate is divulged. The PSOI substrate may be thereafter utilized as a starting material for power integrated technologies where both dielectrically isolated devices as well as backside electrically and / or thermally connected devices are required on the same die. Disclosed method relies predominantly on standard manufacturing process steps utilized for regular SOI production such as wafer bonding, grinding and polishing.
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