脉冲电感耦合等离子体上升周期的时间分辨电子密度测量

J. Brandon, K. Ford, D. Peterson, S. Shannon
{"title":"脉冲电感耦合等离子体上升周期的时间分辨电子密度测量","authors":"J. Brandon, K. Ford, D. Peterson, S. Shannon","doi":"10.1109/PLASMA.2017.8496046","DOIUrl":null,"url":null,"abstract":"Pulsed low temperature plasmas are an area of recent interest in semiconductor manufacturing applications because they offer a new set of available chemistry when compared to steady state operation. Most work has focused on the transient behavior of these plasmas at the transition from power on to power off. The dynamics of the transition from power off to power on is equally important for process control as it contributes to electron temperature increases, voltage variation, and discharge impedance transients that can all impact application performance. Further, dynamic feedback mechanisms to the external circuitry have been an area of little investigation during the power-on portion of the pulsing cycle.","PeriodicalId":145705,"journal":{"name":"2017 IEEE International Conference on Plasma Science (ICOPS)","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Time-Resolved Electron Density Measurements of the Rise Cycle in a Pulsed Inductively Coupled Plasma\",\"authors\":\"J. Brandon, K. Ford, D. Peterson, S. Shannon\",\"doi\":\"10.1109/PLASMA.2017.8496046\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Pulsed low temperature plasmas are an area of recent interest in semiconductor manufacturing applications because they offer a new set of available chemistry when compared to steady state operation. Most work has focused on the transient behavior of these plasmas at the transition from power on to power off. The dynamics of the transition from power off to power on is equally important for process control as it contributes to electron temperature increases, voltage variation, and discharge impedance transients that can all impact application performance. Further, dynamic feedback mechanisms to the external circuitry have been an area of little investigation during the power-on portion of the pulsing cycle.\",\"PeriodicalId\":145705,\"journal\":{\"name\":\"2017 IEEE International Conference on Plasma Science (ICOPS)\",\"volume\":\"26 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2017 IEEE International Conference on Plasma Science (ICOPS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/PLASMA.2017.8496046\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 IEEE International Conference on Plasma Science (ICOPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PLASMA.2017.8496046","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

脉冲低温等离子体是最近在半导体制造应用中引起兴趣的一个领域,因为与稳态操作相比,它们提供了一套新的可用化学物质。大多数工作都集中在这些等离子体从通电到断电过渡时的瞬态行为上。从断电到通电转换的动态对过程控制同样重要,因为它会导致电子温度升高、电压变化和放电阻抗瞬变,这些都会影响应用性能。此外,在脉冲周期的通电部分,外部电路的动态反馈机制一直是一个很少研究的领域。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Time-Resolved Electron Density Measurements of the Rise Cycle in a Pulsed Inductively Coupled Plasma
Pulsed low temperature plasmas are an area of recent interest in semiconductor manufacturing applications because they offer a new set of available chemistry when compared to steady state operation. Most work has focused on the transient behavior of these plasmas at the transition from power on to power off. The dynamics of the transition from power off to power on is equally important for process control as it contributes to electron temperature increases, voltage variation, and discharge impedance transients that can all impact application performance. Further, dynamic feedback mechanisms to the external circuitry have been an area of little investigation during the power-on portion of the pulsing cycle.
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