基于多阈值技术的深亚微米节点移电平器

Kiran Agarwal, V. Venkateswarlu, D. Anvekar, S. Basu
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引用次数: 4

摘要

器件向深亚微米技术的缩小已经将VLSI CMOS芯片电路设计人员的重点转移到新的设计问题上,如亚阈值泄漏、降低电源电压和阈值电压、DIBL(降低漏极感应势垒)、泄漏电流和速度优化。低通道长度的晶体管在阈值变化、亚阈值泄漏电流和DIBL等特性上存在偏差。本文提出了一种克服短通道器件漏电流的新型电压电平转换电路,与双Vdd传统电平转换电路相比,可节省高达17-32%的功耗。本文给出并分析了该电平移位器在100mhz频率下的仿真结果。延时、功率和漏电流是通过改变负载电容得到的。电路采用0.18µm技术进行仿真。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A level shifter for deep-submicron node using multi-threshold technique
Shrinking of devices to deep sub micron technology have shifted focus of the VLSI CMOS chip circuit designers to new design issues such as sub threshold leakages, reduction of supply voltage and threshold voltages, DIBL (Drain induced Barrier lowering), leakage currents and speed optimization. The transistors at lower channel length show deviation to characteristics such as threshold variation, sub-threshold leakage currents and DIBL. This paper proposes a new voltage level shifter circuit to overcome leakage currents in short channel-devices and can save power up to 17–32% of power consumption compared to dual Vdd conventional level shifter. In this paper we present and analyze the simulation results of the proposed level shifter operated at 100 MHZ frequency. These results for delay, power and leakage current are obtained by varying load capacitance. The circuit is simulated using 0.18µm technology.
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