采用SOI-MEMS技术的差分谐振式气压传感器

Z. Luo, Deyong Chen, Junbo Wang, Jing Chen
{"title":"采用SOI-MEMS技术的差分谐振式气压传感器","authors":"Z. Luo, Deyong Chen, Junbo Wang, Jing Chen","doi":"10.1109/ICSENS.2013.6688394","DOIUrl":null,"url":null,"abstract":"This paper presents a resonant barometric pressure sensor based on SOI-MEMS technology. In this device, pressure under measurement causes a deflection of a pressure-sensitive silicon square diaphragm, which is further translated to stress build up in “H” type doubly-clamped micro beams, leading to resonant frequency shift. In device fabrication, SOI-MEMS fabrication processes were utilized, where a new modified buffered hydrofluoric acid (BHF) solution was used to remove the buried oxide layer and release the suspended resonant beams. Experimental results recorded a device resolution of 10Pa, with the nonlinearity of 0.03%, and the temperature coefficient of -0.04% F.S/°C in the range of -40°C to 30°C. The long-term stability error of the proposed device was quantified as 0.05% F.S over the past 3 months.","PeriodicalId":258260,"journal":{"name":"2013 IEEE SENSORS","volume":"18 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":"{\"title\":\"A differential resonant barometric pressure sensor using SOI-MEMS technology\",\"authors\":\"Z. Luo, Deyong Chen, Junbo Wang, Jing Chen\",\"doi\":\"10.1109/ICSENS.2013.6688394\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents a resonant barometric pressure sensor based on SOI-MEMS technology. In this device, pressure under measurement causes a deflection of a pressure-sensitive silicon square diaphragm, which is further translated to stress build up in “H” type doubly-clamped micro beams, leading to resonant frequency shift. In device fabrication, SOI-MEMS fabrication processes were utilized, where a new modified buffered hydrofluoric acid (BHF) solution was used to remove the buried oxide layer and release the suspended resonant beams. Experimental results recorded a device resolution of 10Pa, with the nonlinearity of 0.03%, and the temperature coefficient of -0.04% F.S/°C in the range of -40°C to 30°C. The long-term stability error of the proposed device was quantified as 0.05% F.S over the past 3 months.\",\"PeriodicalId\":258260,\"journal\":{\"name\":\"2013 IEEE SENSORS\",\"volume\":\"18 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2013-12-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2013 IEEE SENSORS\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICSENS.2013.6688394\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 IEEE SENSORS","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICSENS.2013.6688394","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 6

摘要

提出了一种基于SOI-MEMS技术的谐振式气压传感器。在该装置中,测量压力引起压敏硅方形膜片的偏转,这进一步转化为“H”型双夹紧微梁中的应力积聚,导致谐振频率偏移。在器件制造中,利用SOI-MEMS制造工艺,使用一种新型改性缓冲氢氟酸(BHF)溶液去除埋在其中的氧化层并释放悬浮谐振光束。实验结果显示,器件分辨率为10Pa,非线性为0.03%,温度系数为-0.04% F.S/°C,温度范围为-40℃~ 30℃。该装置在过去3个月内的长期稳定性误差被量化为0.05% F.S。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A differential resonant barometric pressure sensor using SOI-MEMS technology
This paper presents a resonant barometric pressure sensor based on SOI-MEMS technology. In this device, pressure under measurement causes a deflection of a pressure-sensitive silicon square diaphragm, which is further translated to stress build up in “H” type doubly-clamped micro beams, leading to resonant frequency shift. In device fabrication, SOI-MEMS fabrication processes were utilized, where a new modified buffered hydrofluoric acid (BHF) solution was used to remove the buried oxide layer and release the suspended resonant beams. Experimental results recorded a device resolution of 10Pa, with the nonlinearity of 0.03%, and the temperature coefficient of -0.04% F.S/°C in the range of -40°C to 30°C. The long-term stability error of the proposed device was quantified as 0.05% F.S over the past 3 months.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信