45纳米低功耗7T SRAM单元优化

A. Jain, S. Sharma
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引用次数: 14

摘要

本文提出了一种低功耗SRAM单元。在提出的SRAM拓扑中,在标准6T-SRAM单元中添加了额外的电路以提高性能。提出了一种45nm特征尺寸的7晶体管(7T) CMOS电池,在稳定性、功耗和性能方面都比以前的低功耗存储器设计有所改善。通过优化尺寸和采用所提出的写电路方案,与传统的基于6T SRAM的设计相比,在存储阵列操作中节省了45%的功耗。详细研究了工艺变化的影响,CADENCE仿真表明,7T SRAM单元对工艺变化具有良好的耐受性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optimization of Low Power 7T SRAM Cell in 45nm Technology
In this paper a low power SRAM cell is proposed. In the proposed SRAM topology, additional circuitry has been added to a standard 6T-SRAM cell to improve the performance. A seven transistor (7T) cell at a 45nm feature size in CMOS is proposed to accomplish improvements in stability, power dissipation and performance compared with previous designs for low-power memory operation. By optimizing size and employing the proposed write circuitry scheme, a saving of 45% in power consumption is achieved in memory array operation compared with a conventional 6T SRAM based design. The impact of process variations is investigated in detail, and the CADENCE simulation shows that the 7T SRAM cell has an excellent tolerance to process variations.
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