w - fuzzy层的热靶hiims沉积

M. Kharkov, D. Kolodko, M. Kukushkina, A. Kaziev, O. Ogorodnikova, G.S. Lomonosov, A. Tumarkin
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引用次数: 0

摘要

采用磁控管沉积法制备多孔钨涂层。沉积在HiPIMS模式下进行,频率为1 kHz,脉冲持续时间为300 μs。钨靶与水冷阴极绝热。样品被安装在距离目标的三个不同距离上。每个样品的温度用专用热电偶测量,并记录整个沉积过程。对w - fuzzy层的结构进行了分析和讨论。在HiPIMS模式下的热靶磁控管系统中,钨丝的沉积速率可达~100 nm/min。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Hot-target HiPIMS deposition of W-fuzz layers
Porous tungsten coatings were prepared by magnetron deposition in He environment. The depositions were carried out in HiPIMS mode with a frequency of 1 kHz and a pulse duration of 300 μs. The tungsten target was thermally insulated from the water-cooled cathode. The samples were mounted on three different distances from the target. Temperature of each sample was measured with a dedicated thermocouple and recorded throughout the deposition process. The structure of resulting W-fuzz layers is analyzed and discussed. The deposition rate of tungsten fuzz in a hot-target magnetron system operated in HiPIMS mode is shown to be ~100 nm/min.
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