D. Benedikovic, P. Cheben, J. Schmid, Danxia Xu, Shurui Wang, S. Janz, R. Halir, A. Ortega-Moñux, M. Dado
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High-efficiency subwavelength-engineered surface grating couplers in SOI and DSOI
The coupling efficiency of a surface grating coupler is optimized for a an arbitrary buried oxide thickness by adjusting the grating radiation angle. The coupler is apodized using a subwavelength structure, allowing a single etch step fabrication. The measured coupling loss is -2.16dB with 3dB bandwidth of 64nm, for a minimum feature size of 100nm. It is also shown by simulations that by implementing this coupler in a double SOI (DSOI) wafer, an ultra-low coupling loss of -0.42dB is achieved.
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