Ru(1010)上hcp铅稳定超高密度膜的生长

Mintcho Tikhov , Richard M. Lambert
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引用次数: 0

摘要

利用LEED和俄歇光谱研究了Pb在140和300 K下在Ru(1010)上的生长。界面接触层通过一系列有序的Pb相“分裂(2×1)”,c(3×2), c(4×2) -其中Pb原子呈现其“正常”大小。在单层点以外出现c(2×4)相,对应于压缩准六方铅覆层的发育。这个阶段之后是一个最不寻常的结构:一个(0001)取向的多层薄膜,六边形紧密堆积的铅,其中原子间间距比fcc体铅小得多(16%)。此外,该间距(3.02±0.06 Å)比大块铅的高压hcp相的特性小约9%,因此对应于已知的最致密的金属Pb形式。超高密度相在300 K时是稳定的,加热到~ 600 K后仍然可以观察到。在研究的整个覆盖范围(多达30个单层)内,没有发生向“正常”hcp或fcc结构的过渡。这些超致密的铅膜对氧也不反应。与此相反,正常密度的、可氧化的fcc Pb膜在其他fcc衬底上形成,这表明超致密Pb膜的结构和电子性能严重依赖于Ru(1010)衬底的特定结构。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Growth of stable ultra-high density films of hcp lead on Ru(1010)

Growth of Pb on Ru(1010) has been investigated at 140 and 300 K by LEED and Auger spectroscopy. The interfacial contact layer evolves through a series of ordered Pb phases “split (2×1)”, c(3×2), c(4×2) - in which the Pb atoms assume their “normal” size. Beyond the monolayer point a c(2×4) phase appears, corresponding to development of compressed quasihexagonal lead overlayer. This phase is followed by a most unusual structure: a (0001)-oriented multilayer film of hexagonally close-packed lead in which the interatomic spacing is much smaller (16%) than that in fcc bulk lead. Furthermore, this spacing (3.02 ± 0.06 Å) is ∼ 9% less than that characteristics of the high pressure hcp phase of bulk lead and therefore corresponds to the most dense form of metallic Pb known. The ultra-high density phase was stable at 300 K and was still observable after heating to ∼ 600 K. No transitions to “normal” hcp or fcc structures occurred over the whole coverage range studied - up to 30 monolayers. These ultra-dense Pb films are also unreactive towards oxygen. In contrast to this, normal density, oxidisable, fcc Pb films are formed other fcc substrates, indicating that the structural and electronic properties of the ultra dense Pb films depend critically on the specific structure of the Ru(1010) substrate.

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