精神分裂症患者沿后顶叶和枕叶区的内在神经时间尺度减少。

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Lavinia Carmen Uscătescu, Sarah Said-Yürekli, Lisa Kronbichler, Renate Stelzig-Schöler, Brandy-Gale Pearce, Luise Antonia Reich, Stefanie Weber, Wolfgang Aichhorn, Martin Kronbichler
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引用次数: 9

摘要

基于独立采集的健康对照(HC)和精神分裂症谱系障碍(SZ)患者静息状态功能磁共振成像(rsfMRI)数据,计算了内在神经时间尺度(INT)。与HC相比,SZ的5个簇均显示INT降低:右侧枕梭状回(rOFG)、左侧枕上回(lSOG)、右侧枕上回(rSOG)、左侧枕外侧皮质(lLOC)和右侧中央后回(rPG)。换句话说,与HC相比,SZ的视觉和后顶叶区域的感觉信息存储的时间似乎缩短了。最后,我们发现症状的严重程度似乎调节了SZ这些区域的INT。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Reduced intrinsic neural timescales in schizophrenia along posterior parietal and occipital areas.

Reduced intrinsic neural timescales in schizophrenia along posterior parietal and occipital areas.

Reduced intrinsic neural timescales in schizophrenia along posterior parietal and occipital areas.

Reduced intrinsic neural timescales in schizophrenia along posterior parietal and occipital areas.

We computed intrinsic neural timescales (INT) based on resting-state functional magnetic resonance imaging (rsfMRI) data of healthy controls (HC) and patients with schizophrenia spectrum disorder (SZ) from three independently collected samples. Five clusters showed decreased INT in SZ compared to HC in all three samples: right occipital fusiform gyrus (rOFG), left superior occipital gyrus (lSOG), right superior occipital gyrus (rSOG), left lateral occipital cortex (lLOC) and right postcentral gyrus (rPG). In other words, it appears that sensory information in visual and posterior parietal areas is stored for reduced lengths of time in SZ compared to HC. Finally, we found that symptom severity appears to modulate INT of these areas in SZ.

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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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