Vibrational kinetics in repetitively pulsed atmospheric pressure nitrogen discharges: average-power-dependent switching behaviour.

IF 3.3 2区 物理与天体物理 Q1 PHYSICS, FLUIDS & PLASMAS
Plasma Sources Science & Technology Pub Date : 2023-01-01 Epub Date: 2023-02-08 DOI:10.1088/1361-6595/aca9f4
Helen L Davies, Vasco Guerra, Marjan van der Woude, Timo Gans, Deborah O'Connell, Andrew R Gibson
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引用次数: 0

Abstract

Characterisation of the vibrational kinetics in nitrogen-based plasmas at atmospheric pressure is crucial for understanding the wider plasma chemistry, which is important for a variety of biomedical, agricultural and chemical processing applications. In this study, a 0-dimensional plasma chemical-kinetics model has been used to investigate vibrational kinetics in repetitively pulsed, atmospheric pressure plasmas operating in pure nitrogen, under application-relevant conditions (average plasma powers of 0.23-4.50 W, frequencies of 1-10 kHz, and peak pulse powers of 23-450 W). Simulations predict that vibrationally excited state production is dominated by electron-impact processes at lower average plasma powers. When the average plasma power increases beyond a certain limit, due to increased pulse frequency or peak pulse power, there is a switch in behaviour, and production of vibrationally excited states becomes dominated by vibrational energy transfer processes (vibration-vibration (V-V) and vibration-translation (V-T) reactions). At this point, the population of vibrational levels up to v 40 increases significantly, as a result of V-V reactions causing vibrational up-pumping. At average plasma powers close to where the switching behaviour occurs, there is potential to control the energy efficiency of vibrational state production, as small increases in energy deposition result in large increases in vibrational state densities. Subsequent pathways analysis reveals that energy in the vibrational states can also influence the wider reaction chemistry through vibrational-electronic (V-E) linking reactions (N + N 2 ( 40 v 45 ) N ( 2 D ) + N 2 ( A ) and N + N 2 ( 39 v 45 ) N + N 2 ( a ' ) ), which result in increased Penning ionisation and an increased average electron density. Overall, this study investigates the potential for delineating the processes by which electronically and vibrationally excited species are produced in nitrogen plasmas. Therefore, potential routes by which nitrogen-containing plasma sources could be tailored, both in terms of chemical composition and energy efficiency, are highlighted.

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重复脉冲大气压氮放电的振动动力学:平均功率依赖的开关行为。
大气压下氮基等离子体的振动动力学特征对于理解更广泛的等离子体化学至关重要,这对于各种生物医学,农业和化学加工应用都很重要。在这项研究中,一个0维等离子体化学动力学模型被用于研究在纯氮中工作的重复脉冲常压等离子体在应用相关条件下(平均等离子体功率为0.23-4.50 W,频率为1-10 kHz,峰值脉冲功率为23-450 W)的振动动力学。模拟预测,在较低的平均等离子体功率下,振动激发态的产生主要由电子撞击过程控制。当等离子体平均功率增加超过一定限度时,由于脉冲频率或峰值脉冲功率的增加,行为发生切换,振动激发态的产生由振动能量传递过程(振动-振动(V-V)和振动-平移(V-T)反应)主导。在这一点上,由于v - v反应引起振动上泵,高达v≥40的振动能级的数量显著增加。当平均等离子体功率接近开关行为发生的位置时,就有可能控制振动态产生的能量效率,因为能量沉积的小增加会导致振动态密度的大增加。后续路径分析表明,能量振动状态也可以通过vibrational-electronic影响更广泛的化学反应(ve)连接反应(N + N 2 (40 v⩽⩽45)→N (2 D) + 2 (A)和N + N 2(39⩽v⩽45)→N + N 2(一个)),这导致潘宁电离作用,增加平均电子密度增加。总的来说,这项研究探讨了在氮等离子体中产生电子和振动激发物质的过程的潜力。因此,在化学成分和能源效率方面,含氮等离子体源可以定制的潜在途径被强调。
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来源期刊
Plasma Sources Science & Technology
Plasma Sources Science & Technology 物理-物理:流体与等离子体
CiteScore
7.10
自引率
31.60%
发文量
258
审稿时长
4.5 months
期刊介绍: Plasma Sources Science and Technology (PSST) reports on low-temperature plasmas and ionized gases operating over all ranges of gas pressure and plasma density, with varying degrees of ionization. The emphasis of PSST is on the fundamental science of these plasmas, their sources and the physical and chemical processes initiated or sustained by them, as elucidated through theoretical, computational or experimental techniques. PSST also reports on new experimentally or theoretically derived fundamental data (e.g. cross sections, transport coefficients) required for investigation of low temperature plasmas. Reports that relate to the technology and applications of these plasmas should be closely linked to the science and fundamental processes occurring in the plasma state.
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