{"title":"Micro-Machining of Glass by Excimer Laser Ablation","authors":"F. V. Alvensleben, C. Graumann, J. Wais","doi":"10.1109/CLEOE.1998.719464","DOIUrl":null,"url":null,"abstract":"Micro-structuring of glass has been examined using UV radiation. The etch depth profile has been investigated. The limitations and possibilities for micro-structuring on glass has been found for the wavelengths of 193nm, 248nm and 308nm.","PeriodicalId":10610,"journal":{"name":"Conference on Lasers and Electro-Optics Europe","volume":"21 12","pages":""},"PeriodicalIF":0.0000,"publicationDate":"1998-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference on Lasers and Electro-Optics Europe","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CLEOE.1998.719464","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Micro-structuring of glass has been examined using UV radiation. The etch depth profile has been investigated. The limitations and possibilities for micro-structuring on glass has been found for the wavelengths of 193nm, 248nm and 308nm.