Enhancement of Performance of a-Si:H Solar Cells by Introducing a p-nc-SiOx:H Nanostructure Buffer Layer

A. Belfar, A. García-Loureiro
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Abstract

In this work, single n-i-p solar cells based on hydrogenated amorphous silicon (a-Si:H) are analyzed using one dimensional AMPS-1D (Analysis of Microelectronic and Photonic Structures) code. Effect of introducing a p-layer based on hydrogenated nanocrystalline silicon oxide (p-nc-SiOx:H) as a buffer layer at i/p interface instead of i-layer based on hydrogenated amorphous silicon carbide (i-a-SiC:H) is analyzed. It is found that the incorporation of p-nc-SiOx:H buffer layer at i/p interface reduces the band mismatch between i-a-Si:H absorber layer and p-nc-SiOx:H window layer and minimizes the defect density near interface. It is also obtained that the spectral response of the solar cell has improved in the wavelength range from 0.48 to 0.7 m with using p-nc-SiOx:H window/p-nc-SiOx:H buffer dual p-layers. So, an enhancement of the output solar cell performances with using p-nc-SiOx:H buffer layer has obtained. In this case, the short circuit current (Jsc) increases from 10.18 mA/cm2 with i-a-SiC:H buffer layer to 13.44 mA/cm2 with p-nc-SiOx:H buffer layer, the open circuit voltage (VOC) improves from 930 mV to 941 mV and the fill factor (FF) increases from 74.2 % to 76.5 %. As a consequence, the conversion efficiency increases from 7.03 % to 9.67 %.
引入p-nc-SiOx:H纳米结构缓冲层增强a- si:H太阳能电池性能
在这项工作中,基于氢化非晶硅(a-Si:H)的单n-i-p太阳能电池使用一维AMPS-1D(微电子和光子结构分析)代码进行了分析。分析了在i/p界面引入基于氢化纳米晶氧化硅(p-nc- siox:H)的p层代替基于氢化非晶碳化硅(i-a- sic:H)的i层作为缓冲层的效果。发现在i/p界面处加入p-nc- siox:H缓冲层减少了i-a- si:H吸收层与p-nc- siox:H窗口层之间的能带失配,使界面附近的缺陷密度最小。在0.48 ~ 0.7m波长范围内,采用p-nc-SiOx:H窗口/p-nc-SiOx:H缓冲层,提高了太阳能电池的光谱响应。因此,使用p-nc-SiOx:H缓冲层可以提高输出太阳能电池的性能。在这种情况下,短路电流(Jsc)从有i-a-SiC:H缓冲层的10.18 mA/cm2增加到有p-nc-SiOx:H缓冲层的13.44 mA/cm2,开路电压(VOC)从930 mV提高到941 mV,填充系数(FF)从74.2%提高到76.5%。因此,转换效率从7.03%提高到9.67%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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