K. Sehra, V. Kumari, Mridula Gupta, M. Mishra, D. S. Rawal, M. Saxena
{"title":"Degradation Mechanisms in a Proton Irradiated HEMT with 3DEG Conduction and 3DHG as a Back Barrier","authors":"K. Sehra, V. Kumari, Mridula Gupta, M. Mishra, D. S. Rawal, M. Saxena","doi":"10.1109/NANO51122.2021.9514295","DOIUrl":null,"url":null,"abstract":"This work evaluates the degradation mechanisms of the proton irradiated HEMTs incorporating graded AlGaN layers that support 3DEG for the conduction and 3DHG as a back barrier and subsequently evaluating it for dosimeter applications. The results presented demonstrate the deleterious effects of the proton fluence on the device's transfer characteristics in creating a bottleneck towards the flow of carriers in the 3DEG sheet. However, the trench gate arrangement with HfO2 insulator controlling the bottleneck for the device operation remains intact even at a high proton fluence.","PeriodicalId":6791,"journal":{"name":"2021 IEEE 21st International Conference on Nanotechnology (NANO)","volume":"11 1","pages":"173-176"},"PeriodicalIF":0.0000,"publicationDate":"2021-07-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 IEEE 21st International Conference on Nanotechnology (NANO)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NANO51122.2021.9514295","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
This work evaluates the degradation mechanisms of the proton irradiated HEMTs incorporating graded AlGaN layers that support 3DEG for the conduction and 3DHG as a back barrier and subsequently evaluating it for dosimeter applications. The results presented demonstrate the deleterious effects of the proton fluence on the device's transfer characteristics in creating a bottleneck towards the flow of carriers in the 3DEG sheet. However, the trench gate arrangement with HfO2 insulator controlling the bottleneck for the device operation remains intact even at a high proton fluence.