Preparation of Metallic Copper Nanoparticles by Reduction of Copper Ions in Aqueous Solution and Their Metal-Metal Bonding Properties

Yoshio Kobayashi, T. Shirochi, Y. Yasuda, T. Morita
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引用次数: 13

Abstract

— This paper describes a method for preparing metallic Cu nanoparticles in aqueous solution, and a metal-metal bonding technique using the Cu particles.Preparation of the Cu particle colloid solution was performed in water at room temperature in air using a copper source (0.01 M Cu(NO 3 ) 2 ), a reducing reagent (0.2 - 1.0 M hydrazine), and stabilizers (0.5×10 -3 M citric acid and 5.0×10 -3 M cetyltrimethylammonium bromide). The metallic Cu nanoparticles with sizes of ca. 60nm were prepared at all the hydrazine concentrations examined. A stage and a plate of metallic Cu were successfully bonded under annealing at 400 o C and pressurizing at 1.2 MPa for 5min in H 2 gas with help of the metallic Cu particles. A shear strength required for separating the bonded Cu substrates reached the maximum value at a hydrazine concentration of 0.8M, and it decreased beyond the concentration. Consequently, the largest shear strength of 22.9 MPa was achieved at the 0.8 M hydrazine concentration.
水溶液中还原铜离子制备金属铜纳米粒子及其金属-金属键合性能
本文介绍了一种在水溶液中制备金属铜纳米粒子的方法,以及利用铜粒子的金属-金属键合技术。用铜源(0.01 M Cu(no3) 2)、还原剂(0.2 ~ 1.0 M联氨)和稳定剂(0.5×10 -3 M柠檬酸和5.0×10 -3 M十六烷基三甲基溴化铵)在室温空气中制备Cu颗粒胶体溶液。在所检测的所有联氨浓度下,制备了尺寸约为60nm的金属铜纳米颗粒。在400℃退火和1.2 MPa加压5min的条件下,利用金属Cu颗粒在h2气体中成功地结合了金属Cu层和金属Cu板。在联氨浓度为0.8M时,分离结合Cu衬底所需的剪切强度达到最大值,超过该浓度后,剪切强度减小。结果表明,当肼浓度为0.8 M时,其抗剪强度最大,达到22.9 MPa。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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