G. Shruthi, G. Baishali, V. Radhakrishna, Payal Verma
{"title":"Reducing graphene oxide using hydroiodic acid fumes and low temperature annealing for enhanced electrical conductivity","authors":"G. Shruthi, G. Baishali, V. Radhakrishna, Payal Verma","doi":"10.1007/s41127-020-00030-4","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":12771,"journal":{"name":"Graphene Technology","volume":"88 1","pages":"19-25"},"PeriodicalIF":0.0000,"publicationDate":"2020-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Graphene Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1007/s41127-020-00030-4","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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