On Both Spatial And Velocity Distribution Of Sputtered Particles In Magnetron Discharge

C. Vițelaru, V. Pohoata, V. Tiron, C. Costin, G. Popa
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Abstract

Abstract The kinetics of the sputtered atoms from the metallic target as well as the time-space distribution of the argon metastable atoms have been investigated for DC and high power pulse magnetron discharge by means of Tunable Diode – Laser Absorption Spectroscopy (TD-LAS) and Tunable Diode – Laser Induced Fluorescence (TD-LIF). The discharge was operated in argon (5-30 mTorr) with two different targets, tungsten and aluminum, for pulses of 1 to 20 μs, at frequencies of 0.2 to 1 kHz. Peak current intensity of ~100 A has been attained at cathode peak voltage of ~1 kV. The mean velocity distribution functions and particle fluxes of the sputtered metal atoms, in parallel and perpendicular direction to the target, have been obtained and compared for DC and pulse mode.
磁控管放电中溅射粒子的空间和速度分布
利用可调谐二极管-激光吸收光谱(TD-LAS)和可调谐二极管-激光诱导荧光(TD-LIF)研究了直流和大功率脉冲磁控管放电中金属靶溅射原子的动力学和氩亚稳原子的时空分布。在氩气(5-30 mTorr)中,以钨和铝两种不同的靶进行放电,脉冲为1 ~ 20 μs,频率为0.2 ~ 1 kHz。在阴极峰值电压为1kv时,达到了~ 100a的峰值电流强度。得到了溅射金属原子在与靶平行方向和垂直方向上的平均速度分布函数和粒子通量,并对直流模式和脉冲模式进行了比较。
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