Process Heating and Postannealing Effects on Microstructure and Hardness of the Sputtered Ni-P-Al Coatings

Yu-Ming Su, Chia-Che Wu, F. Wu
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Abstract

Ternary Ni-P-Al alloy coating was fabricated by magnetron sputtering technique with a Ni-P/Al composite target source. The effects of thermal treatments, including deposition process heating and postannealing, on phase transformation phenomenon and related mechanical properties were investigated. The as-deposited coatings produced under process temperature below 475∘C showed an amorphous/nanocrystalline microstructure. Significant crystallization of Ni matrix and precipitation of Ni𝑥P𝑦 and Ni𝑝Al𝑞 compounds were observed for the coatings manufactured under high sputtering temperatures above 500∘C. The amorphous Ni-P-Al coatings were postannealed from 500 to 600∘C in vacuum environment for comparison. The amorphous feature of the Ni-P-Al coating remained unchanged under a high annealing temperature of 550∘C, showing a superior thermal stability as compared to those fabricated under high process temperatures. Superior hardness was obtained for the post-annealed Ni-P-Al coatings due to volumetric constraint of crystallization and precipitation. On the other hand, the overaging phenomenon and subsequent degradation in hardness were found for the Ni-P-Al coatings fabricated under high-temperature deposition processes. The phase transformation mechanisms of the coatings through different thermal treatments were intensively discussed.
工艺加热和后退火对溅射Ni-P-Al涂层显微组织和硬度的影响
采用磁控溅射技术,以Ni-P/Al复合靶源制备了Ni-P-Al三元合金镀层。研究了热处理工艺对相变现象及相关力学性能的影响。在低于475°C的工艺温度下制备的镀层显示出非晶/纳米晶的微观结构。在500°C以上的高温溅射下制备的涂层有明显的Ni基体结晶,并析出Ni𝑥P 和Ni𝑝Al𝑞化合物。在500到600°C的真空环境下,将非晶Ni-P-Al涂层进行涂膜比较。在550°C的高温下,Ni-P-Al涂层的无定形特性保持不变,与在高温下制备的涂层相比,表现出优越的热稳定性。退火后的Ni-P-Al涂层由于结晶和析出的体积限制而获得了较高的硬度。另一方面,高温沉积法制备的Ni-P-Al涂层存在过时效现象,硬度随之下降。重点讨论了不同热处理方式下涂层的相变机理。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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