Improvement on fabrication technology of metallic mesh based on ZnS

Abstract

In order to fabricate metallic meshes based on ZnS which can shield electromagnetic wave,a new type of photolithography copy technology process is adopted,in which photoresist is coated firstly and then plated in vacuum machine. But the color of polycrystalline ZnS resembles that of photo-resist,it is hard to estimate the developing degree of meshes during the process of making metallic meshes,which affects the preparation of metallic meshes film in the process of vacuum plating. A new method by plating a transition film is proposed,in which the processes including vacuum coating,spin-coating,developing,etching,vacuum coating,removing,etching are adopted combining the fabrication technology of metallic meshes. The testing results indicate that the metallic meshes with the line width of 8 μm and the line period of 400 μm are fabricated successfully. With this technology,the yield of metallic meshes is improved up to 90%.