SiO2 clad active and passive photonic crystal nanocavity devices fabricated with photolithography: Toward future mass production of photonic crystal nanocavity devices
Nurul Ashikin Binti Daud, Y. Ooka, T. Tabata, T. Tetsumoto, T. Tanabe
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引用次数: 2
Abstract
We describe the fabrication and a demonstration of passive and active photonic crystal nanocavity devices, namely an electro-optic modulator, an all-silicon photodetector and a DeMUX filter. This is the first demonstration of active and passive photonic crystal nanocavity devices fabricated with a photolithographic process that may lead to future mass production.