Precursor dependent properties of Ba/sub 1-x/Sr/sub x/TiO/sub 3/ thin films fabricated by sol-gel method

J. Kim, S. Kwun, J. Yoon
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引用次数: 2

Abstract

Thin films of barium strontium titanate, Ba/sub 1-x/Sr/sub x/TiO/sub 3/, were deposited on Si and ITO/glass substrates with 200/spl sim/300 nm thickness by sol-gel method. The precursor solution of BST was prepared by mixing the 0.2 M precursor solutions of BaTiO/sub 3/ and SrTiO/sub 3/ with proper molar ratio. The X-ray diffraction (XRD) patterns show characteristic peaks with weak and broad features indicating that the polycrystalline BST film has poor crystallinity. The grain size and the surface morphology of the films were investigated by atomic force microscope (AFM). Especially, dependence of the film structures on the treatments of precursor solution such as hydrolysis and modification with acetic acid was investigated. The I-V (current-voltage) characteristics of the films was also dependent on the precursor structure. The C-V (capacitance-voltage) behavior of the films with MIS (metal-insulator-semiconductor) and MIM (metal-insulator-metal) structures were studied. Also, dielectric permittivity which was very strongly dependent on the crystallinity of the films was discussed in conjunction with precursor structures.
溶胶-凝胶法制备Ba/sub - 1-x/Sr/sub -x/ TiO/sub - 3/薄膜的前驱体依赖性
采用溶胶-凝胶法制备了厚度为200/spl sim/300 nm的钛酸锶钡薄膜Ba/sub - 1-x/Sr/sub x/TiO/sub 3/。将0.2 M的btio /sub - 3/和SrTiO/sub - 3/前驱体溶液以合适的摩尔比混合制备BST前驱体溶液。x射线衍射(XRD)谱图显示出弱而宽的特征峰,表明多晶BST膜结晶度较差。利用原子力显微镜(AFM)研究了薄膜的晶粒尺寸和表面形貌。研究了前驱体溶液水解和醋酸改性对膜结构的影响。薄膜的I-V(电流-电压)特性也依赖于前驱体结构。研究了具有MIS(金属-绝缘体-半导体)和MIM(金属-绝缘体-金属)结构的薄膜的C-V(电容-电压)行为。同时,结合前驱体结构讨论了与薄膜结晶度密切相关的介电常数。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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