A. Huda, M. K. Md Arshad, N. Othman, C. Voon, R. M. Ayub, S. Gopinath, K. L. Foo, A. R. Ruslinda, U. Hashim, H. C. Lee, P. Adelyn, S. M. Kahar
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引用次数: 4
Abstract
In this paper, the effect of silicon body thickness (TSi) and silicon body width (WSi) variation on DC characteristics in 100 nm gate length silicon-on-insulator (SOI) junctionless (JL) and junction transistors has been investigated by using numerical simulations. The digital figure-of-merits characteristics such as threshold voltage (VTH), on-current, subthreshold voltage, and drain-induced-barrier-lowering are the main parameters that have been investigated. Based on the simulations, the JT device is less sensitive to variation of TSi and WSi compared to JLT.