S. Matsuyama, K. Ishii, S. Suzuki, A. Terakawa, M. Fujiwara, S. Koshio, S. Toyama, S. Ito, M. Fujisawa, T. Nagaya
{"title":"Development of a high-current microbeam system","authors":"S. Matsuyama, K. Ishii, S. Suzuki, A. Terakawa, M. Fujiwara, S. Koshio, S. Toyama, S. Ito, M. Fujisawa, T. Nagaya","doi":"10.1142/S0129083514400038","DOIUrl":null,"url":null,"abstract":"We report on the development of a high-current microbeam system for wavelength-dispersive X-ray micro particle-induced X-ray emission (WDX-μ-PIXE) for chemical state mapping. The microbeam system is composed of two slits and a quadrupole doublet lens mounted on a heavy rigid support. The microbeam system is installed immediately after a switching magnet. A beam brightness of 2.4 pA⋅μm−2⋅mrad−2⋅MeV−1 is obtained at a half-divergence of 0.1 mrad. A beam current of more than 300 pA is obtained for object sizes of 40×10 μm2 with a half-divergence of 0.2 mrad, which corresponds to a beam spot size of 1×1 μm2. The calculated spot size of the beam was 1×1 μm2 and the measured spot size was 1×1.5 μm2. The WDX-μ-PIXE system with the microbeam system is now operational.","PeriodicalId":14345,"journal":{"name":"International Journal of PIXE","volume":"3 1","pages":"101-110"},"PeriodicalIF":0.0000,"publicationDate":"2014-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of PIXE","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1142/S0129083514400038","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 6
Abstract
We report on the development of a high-current microbeam system for wavelength-dispersive X-ray micro particle-induced X-ray emission (WDX-μ-PIXE) for chemical state mapping. The microbeam system is composed of two slits and a quadrupole doublet lens mounted on a heavy rigid support. The microbeam system is installed immediately after a switching magnet. A beam brightness of 2.4 pA⋅μm−2⋅mrad−2⋅MeV−1 is obtained at a half-divergence of 0.1 mrad. A beam current of more than 300 pA is obtained for object sizes of 40×10 μm2 with a half-divergence of 0.2 mrad, which corresponds to a beam spot size of 1×1 μm2. The calculated spot size of the beam was 1×1 μm2 and the measured spot size was 1×1.5 μm2. The WDX-μ-PIXE system with the microbeam system is now operational.