Development of a high-current microbeam system

S. Matsuyama, K. Ishii, S. Suzuki, A. Terakawa, M. Fujiwara, S. Koshio, S. Toyama, S. Ito, M. Fujisawa, T. Nagaya
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引用次数: 6

Abstract

We report on the development of a high-current microbeam system for wavelength-dispersive X-ray micro particle-induced X-ray emission (WDX-μ-PIXE) for chemical state mapping. The microbeam system is composed of two slits and a quadrupole doublet lens mounted on a heavy rigid support. The microbeam system is installed immediately after a switching magnet. A beam brightness of 2.4 pA⋅μm−2⋅mrad−2⋅MeV−1 is obtained at a half-divergence of 0.1 mrad. A beam current of more than 300 pA is obtained for object sizes of 40×10 μm2 with a half-divergence of 0.2 mrad, which corresponds to a beam spot size of 1×1 μm2. The calculated spot size of the beam was 1×1 μm2 and the measured spot size was 1×1.5 μm2. The WDX-μ-PIXE system with the microbeam system is now operational.
大电流微束系统的研制
本文报道了一种用于波长色散x射线微粒子诱导x射线发射(WDX-μ-PIXE)的大电流微光束系统的开发,用于化学态映射。微光束系统由两个狭缝和一个安装在重型刚性支架上的四极双透镜组成。微束系统安装在开关磁体之后。在0.1 mrad的半散度下,光束亮度为2.4 pA⋅μm−2⋅mrad−2⋅MeV−1。当物体尺寸为40×10 μm2,半发散度为0.2 mrad时,光束电流大于300 pA,对应的光束光斑尺寸为1×1 μm2。计算光斑尺寸为1×1 μm2,实测光斑尺寸为1×1.5 μm2。带有微束系统的WDX-μ-PIXE系统现已投入使用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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