Synthesis of High Quality Complex Oxide Thin Films by Pulsed Laser Deposition

Abstract

Reproducible way to grow high quality complex oxide thin films by means of pulsed laser deposition is addressed. Laser ablation conditions are the most essential ones to be controlled precisely because it directly relates to cation ratio of deposited thin films. In some specific case, substrate temperature and gas pressure also become important to control the film composition. Film quality is tightly correlated to the thin film stoichiometry.