K. Müller, V. Rupertus, H. Oechsner, V. Scheuer, T. Tschudi
{"title":"Analysis of sputter deposited and evaporated tantalum oxide layers on SiO2 by SNMS, XPS, TDS and TRFA","authors":"K. Müller, V. Rupertus, H. Oechsner, V. Scheuer, T. Tschudi","doi":"10.1007/BF00572362","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":12372,"journal":{"name":"Fresenius' Zeitschrift für analytische Chemie","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1989-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Fresenius' Zeitschrift für analytische Chemie","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1007/BF00572362","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}