Study of boron nitride thin films for ultraviolet-sensor applications

Nisar Ahmad , David Lichtman
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引用次数: 6

Abstract

A study is carried out to evaluate the ability of boron nitride thin films to act as ultraviolet - sensitive semiconductors. Boron nitride thin films are sputter deposited from a BN target in Ar, Ar/N2 and N2 discharges. Inter-digital electrodes of various geometries and varying spacing are laid out photolithographically. Results of I(dark) verus voltage and I(u.v.) versus V in the temperature range −40 °C to 80°C are presented here. Preliminary studies on the effect of doping boron nitride films with aluminum and zinc impurities do not yield significant results.

氮化硼薄膜在紫外传感器中的应用研究
研究了氮化硼薄膜作为紫外敏感半导体材料的性能。在氩气、氩气/氮气和氮气放电条件下,从氮化硼靶上溅射沉积氮化硼薄膜。不同几何形状和不同间距的数字间电极采用光刻法布置。在- 40°C到80°C的温度范围内,给出了I(暗)vs电压和I(uv) vs V的结果。对氮化硼薄膜中掺杂铝和锌杂质的影响进行了初步研究,并没有得到显著的结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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