Response of the in vivo chlorophyll fluorescence spectrum to environmental factors and laser excitation wavelength

G. Agati
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引用次数: 104

Abstract

The laser-induced chlorophyll (Chl) fluorescence spectrum in vivo at the steady state was investigated as a function of the leaf temperature between 25 and at low light intensity . The ratio between the red and far-red fluorescence bands, F685/F730, was seen to decrease with decreasing leaf temperature, while the fluorescence intensity at both the 685 and 730 nm peaks increased going from 25 to . This behaviour appears to be the same in chilling-sensitive plants ( Lycopersicon esculentum and Phaseolus vulgaris) as well as in chilling-tolerant species ( Pisum sativum and Vicia faba). Under high light intensity , at controlled temperature, F685/F730 as well as the total fluorescence intensity was seen to decrease with irradiation time. Since photosystem I (PSI) contributes to the F730 emission band only, while photosystem II (PSII) contributes to both F685 and F730, the above results can be explained as being due to the change with light intensity and temperature of quenching processes that affect PSII more than PSI. Changing the light intensity impinging on the leaf, the total Chl fluorescence increases with increasing light intensity to a maximum reached at about , then it decreases to values close to the dark level of fluorescence . The Chl fluorescence spectrum was seen to vary in shape by changing the excitation wavelength. The well known process of Chl fluorescence reabsorption is responsible for the decrease in the F685/F730 going from less (440 nm) to more (635 nm) penetrating excitation light. With UV excitation at 337 nm, an unexpected lower value for F685/F730 with respect to blue excitation was found.
体内叶绿素荧光光谱对环境因子和激光激发波长的响应
研究了激光诱导叶绿素(Chl)荧光光谱随叶片温度(25 -弱光)的变化规律。随着叶温的降低,红色和远红色荧光波段之比F685/F730减小,而685和730 nm峰的荧光强度从25 ~ 30 nm增加。这种行为似乎在对寒冷敏感的植物(番茄和菜豆)以及耐冷的植物(Pisum sativum和蚕豆)中是相同的。在高光强下,在受控温度下,F685/F730以及总荧光强度随照射时间的增加而降低。由于光系统I (PSI)仅对F730发射带有贡献,而光系统II (PSII)对F685和F730都有贡献,因此上述结果可以解释为淬火过程随光强和温度的变化对PSII的影响大于PSI。改变照射在叶片上的光强,总Chl荧光随光强的增加而增加,在约达到最大值,然后下降到接近荧光暗电平的值。Chl荧光光谱随激发波长的变化而变化。众所周知的Chl荧光重吸收过程是F685/F730从较少(440 nm)到较多(635 nm)穿透激发光减少的原因。在337 nm的紫外激发下,发现F685/F730相对于蓝色激发有一个意想不到的较低值。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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