Zhenhai Wu, Jiao Long, Jun Zhang, Qian Xiong, Xiong-jun Zhang, D. Hu
{"title":"Optical Isolation of the Amplifier Cavity in XG-III PW Beamline","authors":"Zhenhai Wu, Jiao Long, Jun Zhang, Qian Xiong, Xiong-jun Zhang, D. Hu","doi":"10.3390/opt4010009","DOIUrl":null,"url":null,"abstract":"Optical isolation with high-quality, large-aperture polarizers is commonly used in high-power laser facilities to suppress retro-reflected pulses. However, it is hard to manufacture these polarizers. We propose an approach of optical isolation with two plasma-electrode Pockels cells instead of large-aperture polarizers. In this approach, Nd:glass slabs placed at the Brewster′s angle are used as polarizers. The analysis results and the application performances in the Xingguang (Star Light) XG-III PW beamline indicate that this approach can supply good protection to optical components in laser facilities.","PeriodicalId":54548,"journal":{"name":"Progress in Optics","volume":"12 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2023-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Progress in Optics","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.3390/opt4010009","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"Materials Science","Score":null,"Total":0}
引用次数: 0
Abstract
Optical isolation with high-quality, large-aperture polarizers is commonly used in high-power laser facilities to suppress retro-reflected pulses. However, it is hard to manufacture these polarizers. We propose an approach of optical isolation with two plasma-electrode Pockels cells instead of large-aperture polarizers. In this approach, Nd:glass slabs placed at the Brewster′s angle are used as polarizers. The analysis results and the application performances in the Xingguang (Star Light) XG-III PW beamline indicate that this approach can supply good protection to optical components in laser facilities.