{"title":"Process Technology for Production of Hydrogen-Rich Water and Water Characterizing by Highly Negative Oxidation Reduction Potential","authors":"Edward Reszke, Grzegorz Binkiewicz, G. Schroeder","doi":"10.9734/ajacr/2022/v12i1214","DOIUrl":null,"url":null,"abstract":"The construction of plasma reactors and the technological process of obtaining water rich in hydrogen and characterized by a negative oxidation potential are presented in the publication. Hydrogen-rich water was obtained based on non-plasma technology and water saturation with hydrogen gas in a reactor vessel or in glass bottles. We have developed a plasma flow reactor that allows for contactless microstructuring and modifying the properties of water / aqueous solutions by resonant stochastic vibration amplification of selected chemical compounds in water with broadband electromagnetic noise with frequencies ranging from 100 Hz to 50 MHz generated during plasma discharge. This water is then saturated with hydrogen gas in the reactor or in glass bottles. The water obtained in the reactor is characterized by a high concentration of hydrogen (8 mg/L) and a negative oxidation-reduction potential (ORP) value (-450 mV). In this technology, the process of saturating water with hydrogen in a 1 m3 tank at a temperature of 20oC takes about 30 minutes. In the technology of obtaining water with negative ORP potential in the bottles, the process of saturating the water with hydrogen lasts only 5-10 seconds. Water obtained with such technology in the glass bottles does not contain much hydrogen gas after 24 hours, while it is characterized by a negative ORP value of about -380 mV even for a period of three months. Obtaining water with presented parameters is possible only in the case of water subjected to the influence of broadband electromagnetic noise with frequencies ranging from 100 Hz to 50 MHz generated during plasma discharge.","PeriodicalId":8480,"journal":{"name":"Asian Journal of Applied Chemistry Research","volume":"11 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2022-10-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Asian Journal of Applied Chemistry Research","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.9734/ajacr/2022/v12i1214","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The construction of plasma reactors and the technological process of obtaining water rich in hydrogen and characterized by a negative oxidation potential are presented in the publication. Hydrogen-rich water was obtained based on non-plasma technology and water saturation with hydrogen gas in a reactor vessel or in glass bottles. We have developed a plasma flow reactor that allows for contactless microstructuring and modifying the properties of water / aqueous solutions by resonant stochastic vibration amplification of selected chemical compounds in water with broadband electromagnetic noise with frequencies ranging from 100 Hz to 50 MHz generated during plasma discharge. This water is then saturated with hydrogen gas in the reactor or in glass bottles. The water obtained in the reactor is characterized by a high concentration of hydrogen (8 mg/L) and a negative oxidation-reduction potential (ORP) value (-450 mV). In this technology, the process of saturating water with hydrogen in a 1 m3 tank at a temperature of 20oC takes about 30 minutes. In the technology of obtaining water with negative ORP potential in the bottles, the process of saturating the water with hydrogen lasts only 5-10 seconds. Water obtained with such technology in the glass bottles does not contain much hydrogen gas after 24 hours, while it is characterized by a negative ORP value of about -380 mV even for a period of three months. Obtaining water with presented parameters is possible only in the case of water subjected to the influence of broadband electromagnetic noise with frequencies ranging from 100 Hz to 50 MHz generated during plasma discharge.