Fabrication Process Development for As2S3 Planar Waveguides using Standard Semiconductor Processing

Abstract

We have developed an effective fabrication process for As₂S₃ waveguides. A bottom anti-reflection coating provides a suitable layer to protect the As₂S₃ film from attack by the alkaline developer whilst CHF₃ plasma enables the patterning of waveguides with vertical-profile and smooth sidewalls.