Analyses of Short Channel Effects of Single-Gate and Double-Gate Graphene Nanoribbon Field Effect Transistors

H. Sarvari, Amir Ghayour, Z. Chen, R. Ghayour
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引用次数: 4

Abstract

Short channel effects of single-gate and double-gate graphene nanoribbon field effect transistors (GNRFETs) are studied based on the atomistic orbital model for the Hamiltonian of graphene nanoribbon using the nonequilibrium Green’s function formalism. A tight-binding Hamiltonian with an atomistic orbital basis set is used to describe the atomistic details in the channel of the GNRFETs. We have investigated the vital short channel effect parameters such as and , the threshold voltage, the subthreshold swing, and the drain induced barrier lowering versus the channel length and oxide thickness of the GNRFETs in detail. The gate capacitance and the transconductance of both devices are also computed in order to calculate the intrinsic cut-off frequency and switching delay of GNRFETs. Furthermore, the effects of doping of the channel on the threshold voltage and the frequency response of the double-gate GNRFET are discussed. We have shown that the single-gate GNRFET suffers more from short channel effects if compared with those of the double-gate structure; however, both devices have nearly the same cut-off frequency in the range of terahertz. This work provides a collection of data comparing different features of short channel effects of the single gate with those of the double gate GNRFETs. The results give a very good insight into the devices and are very useful for their digital applications.
单门和双门石墨烯纳米带场效应晶体管的短沟道效应分析
基于石墨烯纳米带哈密顿量的原子轨道模型,采用非平衡格林函数形式,研究了单栅极和双栅极石墨烯纳米带场效应晶体管(gnrfet)的短通道效应。采用具有原子轨道基集的紧密结合哈密顿量来描述gnrfet通道中的原子细节。我们详细研究了重要的短沟道效应参数,如和、阈值电压、亚阈值摆幅和漏极诱导势垒降低与gnrfet沟道长度和氧化物厚度的关系。为了计算gnrfet的固有截止频率和开关延迟,还计算了两种器件的栅极电容和跨导。此外,还讨论了沟道掺杂对双栅GNRFET阈值电压和频率响应的影响。我们已经证明,与双栅结构相比,单门gnfet受短沟道效应的影响更大;然而,这两种设备在太赫兹范围内具有几乎相同的截止频率。这项工作提供了一组数据,比较了单栅极与双栅极gnrfet的短通道效应的不同特征。结果提供了一个很好的洞察设备,并为他们的数字应用非常有用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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