Y. Fujimura, O. Hirabayashi, T. Sasaki, A. Suzuki, A. Kawasumi, Y. Takeyama, K. Kushida, G. Fukano, A. Katayama, Y. Niki, T. Yabe
{"title":"A configurable SRAM with constant-negative-level write buffer for low-voltage operation with 0.149µm2 cell in 32nm high-k metal-gate CMOS","authors":"Y. Fujimura, O. Hirabayashi, T. Sasaki, A. Suzuki, A. Kawasumi, Y. Takeyama, K. Kushida, G. Fukano, A. Katayama, Y. Niki, T. Yabe","doi":"10.1109/ISSCC.2010.5433813","DOIUrl":null,"url":null,"abstract":"This paper presents a configurable SRAM for low-voltage operation with constant-negative-level write buffer (CNL-WB) and level programmable wordline driver for single supply (LPWD-SS) operation. CNL-WB is suitable for compilable SRAMs and it improves write margin by featuring an automatic BL-level adjustment for configuration range of four to 512 cells/BL using a replica-BL technique. LPWD-SS optimizes the tradeoff between disturb and write margin of a memory cell, allowing a 60% shorter WL rise time than that of the conventional design [1] at 0.7V. A test-chip is fabricated in a 32nm high-k metal-gate CMOS technology with a 0.149µm2 6T-SRAM cell. Measurement results demonstrate a cell-failure rate improvement of two orders of magnitude for an array-configuration range of 64 to 256 rows by 64 to 256 columns.","PeriodicalId":6418,"journal":{"name":"2010 IEEE International Solid-State Circuits Conference - (ISSCC)","volume":"1 1","pages":"348-349"},"PeriodicalIF":0.0000,"publicationDate":"2010-03-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"34","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 IEEE International Solid-State Circuits Conference - (ISSCC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSCC.2010.5433813","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 34
Abstract
This paper presents a configurable SRAM for low-voltage operation with constant-negative-level write buffer (CNL-WB) and level programmable wordline driver for single supply (LPWD-SS) operation. CNL-WB is suitable for compilable SRAMs and it improves write margin by featuring an automatic BL-level adjustment for configuration range of four to 512 cells/BL using a replica-BL technique. LPWD-SS optimizes the tradeoff between disturb and write margin of a memory cell, allowing a 60% shorter WL rise time than that of the conventional design [1] at 0.7V. A test-chip is fabricated in a 32nm high-k metal-gate CMOS technology with a 0.149µm2 6T-SRAM cell. Measurement results demonstrate a cell-failure rate improvement of two orders of magnitude for an array-configuration range of 64 to 256 rows by 64 to 256 columns.