Production of Prototype of New LPCVD Using Lamp Heating and Its Study of Characteristics - Properties of Polysilicon Film Deposited -

Abstract

In the micromachining research field, there are great demands to reduce the start-up and shut-down time of film deposition system, to reduce running costs, to produce thick film of polysilicon, and to enable the high-speed polysilicon film deposition. However, no such polysilicon film deposition system which fulfills the above-listed demans can currently he found. Therefore, in order to meet these demands, the authors designed new LPCVD which is characterized by spot-heating using a lamp and produced a prototype of this apparatus, and actually operated this apparatus to study its characteristics.